Lamp heated rapid thermal annealing RTA and rapid thermal processing RTP equipment are using lamp heating in order to ramp up and cool down semiconductor wafers pretty fast. The high ramp rates allow a short overall process time and keep the thermal budget (this is the total time of a wafer, being exposed to high temperature) of the wafer low. Because of the design of the heaters, these RTA and RTP tools are used mainly for single wafer treatment.
The furnaces offer a unique lamp arrangement with upper and lower cross lamp arrays. The temperature distribution tool provides outstanding and unparalleled temperature uniformity resulting in process repeatability
Implantation / Contact Annealing
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